By Harold M. Anderson (auth.), Yves Pauleau (eds.)
Materials and approaches for floor and Interface Engineering, which has been written by way of specialists within the fields of deposition know-how and floor amendment concepts, deals modern instructional papers at the most recent advances in floor and interface engineering. The emphasis is on primary points, ideas and purposes of plasma and ion beam processing know-how.
A instruction manual for the engineer and scientist in addition to an advent for college kids in different branches of fabrics technology and floor engineering.
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Additional info for Materials and Processes for Surface and Interface Engineering
Sample text
In the late 1980's, a planar coil configuration was developed, renewing interest in the use of high density inductive for plasma processing [21]. Although work also continues on cylindrical source designs, this discussion will be limited to planar designs which have sparked the current interest. The planar coil, inductively coupled source configuration is shown schematically in figure 11. The coil is a flat helix wound from ncar the center 19 axis to near the outer radius of the source chamber.
15. R. L. L. R. (1994) The GEC RF Reference Cell: A Defined Parallel-Plate Radio-Frequency System for Experimental and Theoretical Studies of Plasma-Processing Discharges, Rev. Sci. , 65, 140-154. 16. I. (1986) Mechanisms for power deposition in Ar/SiH4 capacitively coupled rf discharges, IEEE Trans. Plasma Sci, PS-14, 188-196. 17. M. P. (1992) Electrical isolation ofradio-frequcncy plasma discharges, 1. Appl. Phys. 71, 1171-1176. 18. L. c. (1991) Operational characteristics of SF6 etching in an electron cyclotron resonance plasma reactor, 1.
Note that this potential is negative (attractive) for the electrons, entering the potential well of the other atom. The second and most important contribution to the interaction energy of two overlapping electron clouds is the increase of the kinetic energy of electrons, This is evidently always positive, and leads to the repulsion of overlapping electron clouds. The last and smallest term in the interaction energy of two atoms is the exchange and correlation energy, which results actually from applying second order perturbation theory and accounts for the repulsion of nearby electrons due to parallel spins and negative charge.
